Regensburg 2016 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
MA: Fachverband Magnetismus
MA 17: Poster Session I
MA 17.23: Poster
Dienstag, 8. März 2016, 09:30–12:30, Poster B1
Fabrication and lift-off of magnetic nanoparticles functionalized by exchange bias layer system via nanoimprint lithography — •Jendrik Gördes1, Timo Ueltzhöffer1, Sabrina Reuter2, Uh-Myong Ha2, Arno Ehresmann1, and Hartmut Hillmer2 — 1Department of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, D-34132 Kassel — 2Institute of Nanostructure Technologies and Analytics (INA) and Department of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, D-34132 Kassel
Polymer nanoparticles have been fabricated by substrate conformal imprint lithography (SCIL [1]). The particles were functionalized by covering them with an exchange bias layer system. The particles were geometrically characterized by scanning electron microscopy. Magnetically they were characterized by Kerr magnetometry. The functionalization by an exchange bias layer system introduces a defined magnetic anisotropy along a geometric axis of the brick-shaped particles. Agglomeration characteristics of these particles were investigated.
[1] V. R. Kolli, C. Woidt and H. Hillmer, Advanced Materials Research. Vol. 1119, pp. 179-183 (2015) Trans Tech Publications