Regensburg 2016 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

MA: Fachverband Magnetismus

MA 17: Poster Session I

MA 17.50: Poster

Tuesday, March 8, 2016, 09:30–12:30, Poster B1

Improvement of the epitaxial growth of MnSi thin films — •Patricia Herbst¹, David Schroeter¹, Peter Krebs², Dirk Thorsten Dziomba², Stefan Süllow¹, and Dirk Menzel¹ — ¹Institut für Physik der Kondensierten Materie, Technische Universität Braunschweig, Braunschweig, Germany — ²Physikalisch Technische Bundesanstalt, Braunschweig, Germany

The challenge to increase the data storage density in information technology combined with an improvement of data processing requires new concepts of spin-electronic devices. One possible route is the creation of functionalites which utilize magnetic skyrmions. Nano-sized B20 MnSi in form of thin films and quantum wires offers a high potential to promote such future technology, not least as the magnetic phase diagram shows an enlarged skyrmionic phase compared to bulk. The structural and morphological quality of the required films is of great importance. Therefore, it is mandatory to establish growth techniques which provide for reliable and reproducible outcome of high grade. In this work MnSi thin films have been grown via molecular beam epitaxy and characterized using AFM and SQUID measurements. Films with 30 nm thickness show a RMS surface roughness of 3 nm compared to prior results with considerably poor surface morphology. The enhanced film quality makes it now possible to observe and identify clearly the magnetic phase transitions from simple magnetization measurements.