Regensburg 2016 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 3: X-ray Imaging, Holography, Ptychography and Tomography

MI 3.1: Hauptvortrag

Mittwoch, 9. März 2016, 10:00–10:45, H5

Laboratory-based X-ray microscopy - Technique and applications — •Ehrenfried Zschech, Jürgen Gluch, Sven Niese, Kristina Kutukova, and Qiong Li — Fraunhofer IKTS Dresden, Germany

High-resolution nondestructive characterization of materials and structures, including kinetic processes in materials, is a highly ranked request from basic research (e. g. in materials science and nanotechnology). Due to the particular properties of X-rays, i. e. high penetration of matter and good material contrast in absorption, high resolution X-ray imaging is a versatile tool for nondestructive 3D bulk analysis of materials and for the investigation of complex 3D structures. Novel focusing lenses, so-called multilayer Laue lenses, have the potential to bring hard X-ray microscopy (high photon energy) at high efficiencies to resolutions down to the 10 nm range and below.

Examples for materials development supported by high-resolution X-ray imaging and analysis will be shown, including studies of kinetic processes in materials: Physical failure analysis in 3D-stacked microchips, kinetic reactions for energy storage and conversion processes, crack initiation and propagation in microchips and composites. Eventually, the application to biological objects (cells, pollen grains) will be demonstrated.