Regensburg 2016 – wissenschaftliches Programm
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MI: Fachverband Mikrosonden
MI 4: Helium and Neon Ion Microscopy for the Analysis and Structuring on the Nanoscale
MI 4.1: Vortrag
Mittwoch, 9. März 2016, 15:00–15:15, H5
Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry — •Nico Klingner1, René Heller1, Gregor Hlawacek1, Johannes von Borany1, John Notte2, Jason Huang2, and Stefan Fascko1 — 1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany — 2Ion Microscopy Innovation Center at Carl Zeiss Microscopy LLC, Peabody, USA
Helium ion microscopes (HIM) have become powerful imaging devices within the last decade. Their enormous lateral resolution of below 0.3 nm and the highest field of depth make them a unique tool in surface imaging. Up to now there are only limited possibilities for elemental analysis. Therefore we successfully implemented time of flight backscattering spectrometry (ToF-BS) into the HIM. Its integration introduces the ability to perform laterally resolved elemental analysis as well as elemental depth profiling on the nm scale. A lateral resolution of ≤ 54 nm and a time resolution of Δt ≤ 17 ns (Δt/t = 5.4%) are achieved. In addition laterally resolved time of flight secondary ion mass spectrometry (ToF-SIMS) can be performed with the same setup. Time of flight is implemented by pulsing the primary ion beam. This is achieved in a cost effective and minimal invasive way that does not influence the high resolution capabilities of the microscope when operating in standard secondary electron imaging mode. This technique can thus be easily adapted to existing devices. The particular implementation of ToF-BS and ToF-SIMS techniques are described, results are presented and advantages, challenges and limitations of this new techniques are discussed.