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MM: Fachverband Metall- und Materialphysik

MM 59: Topical session: In-situ Microscopy with Electrons, X-Rays and Scanning Probes in Materials Science VII - Nanomaterials

MM 59.2: Vortrag

Donnerstag, 10. März 2016, 16:15–16:45, H38

Advanced AFM based electrical and mechanical characterization of nanostructured materials under controlled environment — •Christian Teichert, Markus Kratzer, Igor Beinik, Christian Ganser, and Franz J Schmied — Institute of Physics, Montanuniversität Leoben, Austria

Besides morphological characterization, atomic-force microscopy (AFM) based techniques can successfully be employed to study physical properties on the nanometer scale under controlled environmental conditions. Here, we will in particular focus on the measurement of electrical and optoelectronic properties of semiconductor nanostructures under simultaneous irradiation by light via photoconductive AFM and photo-assisted Kelvin Probe Force Microscopy [1-2]. With respect to mechanical characterization, AFM based nanoindentation experiments on cellulosic films and fibers under controlled humidity will be presented [3-4]. Finally, procedures are introduced where the AFM is just used to apply and measure specific forces among nanostructures [5].

[1] M. Kratzer, et al., Phys. Rev. B 86 (2012) 245320. [2] I. Beinik, et al., Beilstein J. Nanotechnol. 4 (2013) 208. [3] C. Ganser, et al., Holzforschung 68 (2014) 53. [4] C. Ganser, et al., Bioinspired, Biomimetic and Nanobiomaterials 3 (2014) 131. [5] F.J. Schmied, et al., Sci. Rep. 3 (2013) 2432.