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O: Fachverband Oberflächenphysik
O 24: Plasmonics and Nanooptics: Fabrication, Characterization and Applications
O 24.8: Poster
Montag, 7. März 2016, 18:15–20:30, Poster E
Surface potential studies on nanostructured plasmonic films under monochromatic illumination — •Ömer Akay1, Eser M. Akinoglu1,2, Klaus Schwarzburg3, and Michael Giersig1,3 — 1Freie Universität Berlin, Department of Physics, Berlin, Germany — 2Max-Planck-Institut für Kolloid- und Grenzflächenforschung, Potsdam-Golm Science Park, Potsdam, Germany — 3Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Institut Nanoarchitekturen für die Energieumwandlung, Berlin, Germany
Recently, surface potential changes were observed when plasmon active and optically thin metal films with periodic perforations on the nanoscale are illuminated with monochromatic light in the range of the plasmon resonance of the studied nanostructured film. This effect is described as a plasmoelectric effect that could convert optical energy into electrical potential differences in absence of semiconductors. An applied fabrication method to obtain plasmon active nanostructured metallic films with hexagonally ordered perforations is nanosphere lithography (NSL) in conjunction with plasma etching and physical vapour deposition. We present the characterisation of our systems with optical spectroscopy, atomic force microscopy (AFM) and we study the impact of monochromatic light on plasmon active optically thin and nanostructured metallic films via surface potential measurements using Kelvin probe force microscopy (KPFM) under simultaneous illumination in the energy range of the plasmon resonance peak of our system towards observing plasmoelectric effects.