Regensburg 2016 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 43: Oxides and Insulators: Adsorption I

O 43.7: Vortrag

Dienstag, 8. März 2016, 15:30–15:45, H6

Adsorption and reactivity of phthalic acid on MgO(100) thin films — •Quratulain Tariq, Matthias Franke, Daniel Wechsler, Michael Röckert, Liang Zhang, Hans-Peter Steinrück, and Ole Lytken — Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, 91058 Erlangen, Egerlandstraße 3, Germany

The adsorption of functional organic species on oxide surfaces has importance in many areas of research, for example, in molecular electronics, photovoltaics and biomedical implants. In this work, we report on the adsorption of phthalic acid, a simple dicarboxylic acid, on MgO(100) thin films on Ag(100), as a model for the anchoring of large, functional organic entities such as porphyrins or fullerenes. Using high-resolution synchrotron radiation photoelectron spectroscopy (SRPES), near-edge X-ray absorption fine structure (NEXAFS) and temperature-programmed desorption (TPD), we find that the phthalic acid dissociates below 150 K to phthalic anhydride and carboxylate. Phthalic anhydride desorbs at around 240 K. Carboxylate binds to MgO as bis-bidendate species and stable up to 500 K, after which it decomposes, through desorption of CO2. This project is supported by the DFG through FOR 1878 (funCOS).