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Regensburg 2016 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 54: 2D Materials II: Growth

Mittwoch, 9. März 2016, 10:30–13:00, S053

10:30 O 54.1 Growth and electronic structure of epitaxial single-layer WS2 on Au(111) — •Maciej Dendzik, Matteo Michiardi, Charlotte Sanders, Marco Bianchi, Jill A. Miwa, Signe S. Grønborg, Jeppe V. Lauritsen, Albert Bruix, Bjørk Hammer, and Philip Hofmann
10:45 O 54.2 Synthesis of high quality TaS2 monolayer using molecular beam epitaxy — •Arlette S. Ngankeu, Charlotte E. Sanders, Marco Bianchi, Maciej Dendzik, and Philip Hofmann
11:00 O 54.3 2D Heterojunctions from Non-local Manipulations of the InteractionsMalte Rösner, •Christina Steinke, Michael Lorke, Christopher Gies, Frank Jahnke, and Tim O. Wehling
11:15 O 54.4 TFT Fabrication Based on Liquid Exfoliated MoS2 Flakes — •Xiaoling Zeng, Sonia Metel, Valeria Nicolosi, and Veit Wagner
11:30 O 54.5 Novel Deposition Approach of Semiconducting MoS2 Thin Films and Their Application for Electronic Devices — •Francis Oliver Vinay Gomes, Marko Marinkovic, Jochen Brendt, Torsten Balster, and Veit Wagner
11:45 O 54.6 Growing graphene underneath hBN on Rh(111) — •Uta Schlickum, Daniel Rosenblatt, Sebastian Koslowski, and Klaus Kern
12:00 O 54.7 Prediction of metastable two-dimensional compounds in the C/Si system using global optimization techniques, and investigation of their electronic properties — •Johann Christian Schön and Rico Gutzler
12:15 O 54.8 Tuning the physical properties of MoS2 membranes by organophosphonate interfacial chemistry — •Susanne Schwarzwälder, Réka Csiki, Eric Parzinger, Jeffrey Schwartz, Alexander Holleitner, Martin Stutzmann, Ursula Wurstbauer, and Anna Cattani-Scholz
12:30 O 54.9 Structural analysis of one monolayer of hBN on Cu(111) via NIXSW and SPA-LEED — •Timo Heepenstrick, Christine Brülke, Ina Krieger, Sergey Subach, Simon Weiß, Niklas Humberg, and Moritz Sokolowski
  12:45 O 54.10 The contribution has been withdrawn.
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