Regensburg 2016 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 73: Surface Dynamics: Reactions and Elementary Processes
O 73.8: Poster
Mittwoch, 9. März 2016, 18:15–20:30, Poster A
Theoretical model for the time evolution of a diffusion grating at a solid-liquid interface — Alexandra C. Dávila1, •Eckhard Pehlke1, Daniel Beicht2, and Olaf Magnussen2 — 1Institut für Theoretische Physik und Astrophysik, Christian-Albrechts-Universität zu Kiel — 2Institut für Experimentelle und Angewandte Physik, Christian-Albrechts-Universität zu Kiel
Diffusion at electrochemical interfaces is a fundamental process in electrochemistry. It is the crucial factor determining, e.g., the growth mode during electrolytic deposition and thus, ultimately, the quality of the deposited films. Under UHV conditions, surface diffusion coefficients have been measured by various techniques [see, e.g., J.V. Barth, Surf. Sci. Rep. 40, 75 (2000)], for instance by analyzing the evolution of adsorbate concentration profiles on the surface. Here we go beyond the situation in UHV and present a mathematical model for the time evolution of the concentration profile of a concentration grid at a solid-liquid interface created by Laser induced thermal desorption. The desorption of particles from the adsorbate layer into the liquid, the diffusion in the liquid, and the adsorption back onto the surface are accounted for. The effect of diffusion of the adsorbate through the liquid will be discussed.