Regensburg 2016 – scientific programme

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O: Fachverband Oberflächenphysik

O 97: Nanostructured Surfaces and Thin Films

O 97.3: Talk

Friday, March 11, 2016, 11:00–11:15, S053

Microstructure of Yttrium Oxide Deposited by Reactive RF Magnetron Sputtering with Different Oxygen Inlet Flux — •Yiran Mao, Jan Engels, Anne Houben, Jan Coenen, Marcin Rasinski, Jonathan Steffens, and Christian Linsmeier — Forschungszentrum Jülich GmbH, Institut für Energie- und Klimaforschung - Plasmaphysik, 52425 Jülich, Germany

Yttria (Y2O3) is a well-known ceramic material extensively used in industry and material science applications. Reactive magnetron sputtering is one of the methods to produce Y2O3 coatings. The influence of the oxygen inlet flux on the Y2O3 film microstructure grown by reactive radio-frequency magnetron sputtering was investigated. The oxygen inlet flux showed a hysteresis behavior effect on the deposition rate. With a low oxygen flux, the so called metallic mode process with a high deposition rate (up to 1.4 *m/h) was achieved, while with a high oxygen flux, the process was considered to be in the reactive mode with low deposition rate (~20 nm/h). The metallic mode layers represented a mixture of different crystal structures including the metastable monoclinic phase and the stable cubic phase, while the reactive mode products showed a pure monoclinic phase structure. Comparing the reactive mode layers, the metallic mode layers showed dense structures with less porosity. Annealing at 600 °C for 15 h caused a phase transformation from monoclinic phase to cubic phase for both reactive mode and metallic mode. For metallic mode layers, cracks are formed due to the thermal expansion coefficient difference between Y2O3 and the substrate which was not seen in reactive mode.