Regensburg 2016 – scientific programme

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O: Fachverband Oberflächenphysik

O 97: Nanostructured Surfaces and Thin Films

O 97.8: Talk

Friday, March 11, 2016, 12:15–12:30, S053

Simulation of oblique angle deposition — •Christoph Grüner, Jens Bauer, Stefan Mayr, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig, Germany

Computer simulations are a powerful tool to study thin film growth phenomena. Here, application of simulations focuses on understanding and controlling atomistic processes during glancing angle deposition in order to create nanostructures with unique new physical properties and functionalities. Ballistic deposition models are used to describe kinetics and morphology of film growth [1]. Such simulation outcomes depend strongly on the implementation of the sticking process and the choice of the simulation grid geometry [2]. Focusing on glancing angle deposition, different issues of simple grid based simulations are studied. Shape and tilt angle of the deposited nanostructures are investigated as well as the porosities of the complete films. The benefit of using cluster particles is discussed.

[1] A.-L. Barabasi and H.E. Stanley, Fractal Concepts in Surface Growth, Cambridge Univ. Press, Cambridge 1995

[2] B. Tanto, C. F. Doiron, and T.-M. Lu, Phys. Rev. E 83 (2011), 016703