Regensburg 2016 – scientific programme

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PV: Plenarvorträge

PV IV

PV IV: Plenary Talk

Monday, March 7, 2016, 14:00–14:45, H1

Recent Advances and Opportunities in Electron Microscopy of Materials — •Ulrich Dahmen — National Center for Electron Microscopy, Molecular Foundry, Berkeley, USA

The development of aberration correction for electron microscopy has greatly increased our ability to characterize materials at the atomic scale. The current resolution limit of 0.5Å is now available in a number of advanced instruments around the world. First achieved in 2009 under the TEAM project, this advance has enabled remarkable new science and opened extraordinary opportunities for development and discovery. After briefly describing some of the underlying new technologies such as electron-optical elements, stages, software and detectors, their impact on materials characterization will be highlighted with examples of recent applications at NCEM. These will include tomography, mechanisms and dynamics, observation of beam-sensitive materials, liquid cell microscopy, and high-precision measurement of atomic positions at interfaces in materials. Such observations will be placed in context by highlighting important historical developments and breakthroughs. Looking beyond the current state of the art, this talk will also outline some important opportunities for further developments and innovation in electron microscopy.