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P: Fachverband Plasmaphysik

P 13: Magnetic Confinement

P 13.2: Poster

Dienstag, 14. März 2017, 16:30–18:30, HS Foyer

Global model for radio frequency magnetron sputtering — •Dennis Engel, Dennis Krüger, and Ralf Peter Brinkmann — Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany

During the last decades magnetron sputtering gained a high technological significance. It is used wherever high quality thin films are needed. Due to the high complexity, the active control of this process is current subject of research. Active control allows to keep the plasma in a stable working condition. An efficient model in terms of computation time is required. This work shows one possible model, based on a lumped circuit model for a capacitively coupled radio frequency discharge [1]. The necessary changes to this model regarding the magnetic field are shown. The newly proposed model is used to investigate the influence of various input parameters on the sheath voltage and the discharge current. These parameters can be the magnetic field strength, the neutral gas pressure or the applied voltage.

[1] T. Mussenbrock et al., PSST 16, 377-385 (2007)