Bremen 2017 – scientific programme

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P: Fachverband Plasmaphysik

P 23: Low Temperature Plasmas

P 23.9: Poster

Wednesday, March 15, 2017, 16:30–18:30, HS Foyer

Investigations on the dynamics of non-reactive and reactive high-power impulse magnetron sputtering plasmas — •Katharina Grosse, Wolfgang Breilmann, Christian Maszl, Jan Benedikt, and Achim von Keudell — Ruhr-Universität Bochum

High power impulse magnetron sputtering (HiPIMS) is a technique for thin film deposition and can be operated in reactive and non-reactive mode. The growth rate of HiPIMS in the non-reactive mode reduces to 30% compared to direct current magnetron sputtering (dcMS) at same average power. However, the quality of the coatings produced with HiPIMS is excellent which makes these plasmas highly appealing. Target poisoning is occurring in the reactive mode which among other things influences the plasma dynamics and changes the secondary electron emission coefficient. An advantage of reactive HiPIMS is that the sputtering process can be operated hysteresis-free which can result in a higher growth rate compared to dcMS. In this work, thin films are deposited by a HiPIMS plasma which is generated by short pulses of 100 µs with high peak power densities in the range of >1 kW/cm². Both Ar and Ar/N₂ admixtures are used to sputter a 2” titanium target. The particle transport from the target to the substrate is analysed with time-resolved ion energy distribution measurements and phase-resolved optical emission spectroscopy. Furthermore, the time-resolved growth rate of the deposited film is investigated. The time- and energy-resolved particle fluxes in non-reactive and reactive HiPIMS plasmas are compared and implications on the sputter process are discussed.