Bremen 2017 – scientific programme

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P: Fachverband Plasmaphysik

P 25: Theory and Modeling III

P 25.2: Talk

Thursday, March 16, 2017, 09:00–09:15, HS 2010

Electron dynamics in magnetized technological plasmas: A kinetic description — •Ralf Peter Brinkmann and Dennis Krüger — Ruhr-Universität Bochum

Many advanced thin-film deposition processes like HIPIMS (High Power Impulse Magnetron Sputtering) or PIAD (Plasma-Ion Aided Deposition) employ magnetized plasmas at a pressure range of 0.1 to 1 Pa and a magnetic field of 10 to 100 mT. In such plasmas, the electron gyration radius rL is of the order of a millimeter, whereas the mean free path λ is much larger, typically comparable with the plasma source dimension L itself (some tens to hundreds of millimeters). It is generally acknowledged that in this regime fluid dynamics fails and a kinetic approach is required. This work employs the smallness of the parameter epsilon rL/λ*rL/L to reduce the complexity of that approach to a tractable level. As an application, the phenomenon of spoke formation in HIPIMS discharges is addressed.