Bremen 2017 – scientific programme

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P: Fachverband Plasmaphysik

P 25: Theory and Modeling III

P 25.7: Talk

Thursday, March 16, 2017, 10:15–10:30, HS 2010

Macroparticles in ion beam processing — •Elena Romashchenko, Igor Girka, and Alexander Bizyukov — V.N.Karazin Kharkiv National University, Svobody sq.,4, Kharkiv 61077, Ukraine

Ion beam processing of materials such as vacuum arc deposition and ion implantation is utilized to produce coatings with advantageous properties. The macroparticle (MP) contamination is the most important technological problem. The results of theoretical study of MP charging and dynamics in front of the negatively biased substrate for two energy regimes of ions are presented. The charge and dynamics of MP are governed by local parameters of ion and secondary electron emission fluxes in the sheath. The effect of electron emission from the substrate due to bombardment of multiply charged ions on MP dynamics is studied. It has been found that the MP number decreases with increasing substrate bias for both cases. It is shown that the maximum possible velocity of repelled MP increases with increasing substrate bias voltage.