Bremen 2017 – scientific programme

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P: Fachverband Plasmaphysik

P 5: Plasma Diagnostics

P 5.9: Poster

Monday, March 13, 2017, 16:30–18:30, HS Foyer

Argon Implantation in Composite Magnetron Targets — •Sascha Monje and Vincent Layes — Ruhr-Universität Bochum, Lehrstuhl für Physik reaktiver Plasmen, Bochum, Deutschland

The implantation of argon in different magnetron targets during reactive and non-reactive HPPMS processes was analyzed by doing an in-vacuo characterization of the targets surface composition using x-ray photoelectron spectroscopy. The used targets were circular Al and Cr targets (50mm diameter), as well as Al@Cr and Cr@Al composite targets, which are built of normal Cr (Al) Targets with a cylindrical Insert of Al (Cr) placed in the middle of the racetrack. The non-reactive investigation was performed in the argon dominated and the selfsputtering dominated Mode. The reactive measurements were done only in argon dominated mode due to limitations of the power supply. The characterization of the plasma discharge was done using a CCD-camera and optical emission spectroscopy (OES) to get basic knowledge for the interpretation of the XPS-Measurements. The XPS-investigation was conducted after in-vacuo transfer of the magnetron target to the XPS-chamber. The distribution of redeposited species on the target surface was evaluated and showed a correlation between the redeposited species from the Insert and the concentration of implanted argon. Furthermore, the reactive measurements showed a direct correlation between surface oxidation and argon implantation. The work was supported by the C7 Projekt of the SFB TR 87.