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SYPO: Symposium Plasma und Optische Technologien

SYPO 2: Plasma und Optische Technologien I

SYPO 2.4: Hauptvortrag

Mittwoch, 15. März 2017, 15:25–15:50, GW1 HS

Interface chemistry of thin films deposited from pulsed high power plasmas — •Guido Grundmeier — Lehrstuhl für Technische und Makromolekulare Chemie, Universität Paderborn

Interface chemistry plays a major role during the growth of thin plasma polymer films or plasma hard coatings on engineering materials. Within the SFB-TR87 both the deposition of thin barrier films on polymer substrates and the deposition of wear resistant coatings on tool steels applied for polymer processing are considered. In such cases a strong link between the plasma process and the structure and properties of the thin films is desired. Moreover, the functional properties of such films are mainly dominated by the interfaces between film and substrate, within the plasma film and between the film and the environment. In the frame of the presentation selected examples are discussed which illustrate how advanced interface analysis can promote the development of plasma deposition processes. The surface chemistry of HPPMS TiAlN hard coatings under conditions which are relevant for polymer processing is considered with regard to thermal and electrochemical oxidation. Moreover, studies of the adhesive properties of HPPMS TiAlN hard coatings by means of UHV-AFM are presented. The nucleation and growth of SiOx thin barrier films on model polymer substrates are correlated to the formation of nanoscopic defects in such films.