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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 50: Poster: Organic Electronics and Photovoltaics, Molecular Excitations

CPP 50.11: Poster

Mittwoch, 22. März 2017, 18:30–21:00, P3

Proton Beam Writing in Alq3 — •Clemens Beckmann, Alrik Stegmaier, Ulrich Vetter, and Hans Hofsäss — II. Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany

Proton Beam Writing (PBW) is a direct-write lithography process for nano- and microfabrication of two- or three-dimensional structures [1]. The straight path and low proximity effect of MeV protons in matter allow for the fabrication of structures with high aspect ratio and vertical smooth sidewalls. PBW has been widely studied in resists for lithography and conventional semiconductors like Si and GaAs [1,2]. In this work we focus on PBW in organic semiconductors, which are the key materials in the fast growing field of organic optoelectronics. We will discuss possible ways for structuring of tris(8-hydroxyquinoline)aluminum (Alq3) and present experimental results on the irradiation of Alq3 thin films with high energy protons.

[1] Watt et al, Materials Today 10 6 (2007)

[2] Schulte-Borchers et al, J. Micromech. Microeng. 22 (2012)