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DS: Fachverband Dünne Schichten
DS 36: Postersession I
DS 36.18: Poster
Wednesday, March 22, 2017, 17:00–19:00, P2-EG
Performance characterization of a custom quadrupole setup for creation of an energy and mass selective hyperthermal ion beam — •Michael Mensing1, Philipp Schumacher1, Jürgen W. Gerlach1, Stephan Rauschenbach2, and Bernd Rauschenbach1,3 — 1Leibniz Institute of Surface Modification, Leipzig, Germany — 2Max Planck Institute for Solid State Research, Stuttgart, Germany — 3Faculty of Physics and Earth Sciences, Leipzig University, Leipzig, Germany
To explore the influence of the ion kinetic energy and ion species, i.e. molecular or atomic nitrogen ions, on the growth and the resulting properties of ultrathin nitride films an existing ion-beam assisted molecular beam epitaxy (IBA-MBE) setup is equipped with a radio-frequency quadrupole ion optical setup. Prerequisite to such investigations is a thorough characterization of the properties of the generated ion beam. In this contribution (i) the performance of the mass separation is quantified. (ii) The distribution of the ion energy and its scaling within the hyperthermal energy range (20 eV - 200 eV) is discussed. As the present setup utilizes a constricted glow-discharge plasma source, the controlled extraction of the ions from the plasma determines the ion kinetic energy of the resulting ion beam. (iii) The ion beam shape is determined and (iv) achievable ion beam currents are presented. Furthermore, the influence of space charge effects in individual segments of the setup is evaluated and clarified by ion trajectory simulations using the SIMION computer code. In conclusion, the mass and energy selected ion beam fulfills the requirements for nanofilm growth studies.