Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 36: Postersession I

DS 36.46: Poster

Mittwoch, 22. März 2017, 17:00–19:00, P2-EG

Low temperature transport measurements of metallic nano-structures prepared by area-selective atomic layer deposition on ultrathin platinum templates fabricated with focused electron beam induced deposition — •Peter Gruszka, Giorgia Di Prima, Roland Sachser, and Michael Huth — Goethe Universität, Max-von-Laue-Str. 1, 60438 Frankfurt am Main

Focused electron beam induced deposition (FEBID) is a serial, bottom-up and direct write approach with superior lateral resolution (< 10 nm) but results in samples with poor material purity. Much effort is put into the investigation of optimal deposition parameters to increase the material yield which in most cases is an impossible task. In contrast, atomic layer deposition(ALD) allows for depositing high purity thin films with sub-monolayer accuracy but lacks lateral control. Mackus, et al.[1] developed a combined technique which uses FEBID to predefine templates for the subsequent area selective ALD process.

We performed the combined FEBID-ALD process using purified platinum FEBID nanostructures as templates utilizing a purification technique developed by Sachser, et al.[2]. Afterwards the purified platinum templates were processed with ALD in our scanning electron microscope while monitoring in-situ the conductance over time. Additionally, our transport measurements in a Helium-3 cryostat showed that with this approach one can achieve high purity thin film nano-structures which behave nearly like platinum bulk samples.

[1] Mackus, et al., J. Appl. Phys 107 (2010), 116102

[2] Sachser, et al., ACS Appl. Mater. Interfaces 6 (2014), 15868 - 15874