Dresden 2017 – scientific programme

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DS: Fachverband Dünne Schichten

DS 44: Postersession II

DS 44.13: Poster

Thursday, March 23, 2017, 17:00–19:00, P1C

Growth of oxide microstructures by metalorganic aerosol deposition technique — •Philipp Ksoll, Hannes Gödecke, Christoph Meyer, Marius Keunecke, and Vasily Moshnyaga — I. Physikalisches Institut Göttingen, 37077 Göttingen, Friedrich-Hund-Platz 1

Microstructuring of thin films, usually processed by different lithography tools, is a crucial step for various device applications, e.g. semiconducting electronics, spintronics, photonics, etc. Metalorganic aerosol deposition (MAD) has been shown to be effective technique to grow complex oxide films of high quality. To avoid the complex oxide lithography we developed a MAD method to grow oxide microstructures with a line width down to 1 µ m. Recent material realizations include single, e.g. CuO_x, and complex oxides, i.e. manganites La_1−xSr_xMnO₃. The microstructures were characterized by different types of microscopies, like Raman, atomic force, scanning electron and energy dispersion x-ray analysis.
Financial support by the DFG via SFB 1073 (TP B04) is acknowledged.