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DS: Fachverband Dünne Schichten
DS 44: Postersession II
DS 44.17: Poster
Thursday, March 23, 2017, 17:00–19:00, P1C
Electrical Characterization of Silver Thin Films for Optimization of Low-Emissivity Glass-Coatings — •Julian Mertens, Roland Sittner, and Matthias Wuttig — 1. Physikalisches Institut A, RWTH Aachen
The increasing use of large window areas in modern architecture makes the improvement of efficient low-emissivity coatings indispensable. Therefore the key property to optimize transparent thin film layer stacks used for glass coatings is given by the infrared reflectance. As the infrared reflectance of the corresponding thin film is directly linked to the goodness of electrical conductivity, it is mandatory to gain an understanding of the dominant scattering mechanisms in metallic thin films that dominate conductivity. Due to its lowest bulk-resistivity, silver is the element of choice. To improve the infrared reflectance of silver thin films different layer systems were used and improved over the last twenty years. However, it is still not understood what kind of scattering mechanisms are responsible for the huge increase of specific sheet resistance as the layer thickness decreases. Mayadas and Shatzkes developed a theory which combines diffusive interface scattering, as well as electron scattering at grain boundaries in a total picture, which makes it possible to distinguish between both scattering mechanisms. To apply this approach, the resistivity of thin silver films, deposited on different seed-layers by DC Magnetron Sputter Deposition, is fitted to said theory. The results enable to separate both scattering mechanisms and help to improve the development of layer stack optimization methods.