DS 46: Ion and Electron Beam Induced Processes
Friday, March 24, 2017, 09:30–11:00, CHE 89
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09:30 |
DS 46.1 |
Tuning of magnetic and structural properties of Fe60Al40 thin films by ion irradiation — •Jonathan Ehrler, Rantej Bali, Roman Böttger, Jörg Grenzer, and Kay Potzger
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09:45 |
DS 46.2 |
Material processing via ion beam treatment — •Martin Becker, Angelika Polity, and Peter J. Klar
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10:00 |
DS 46.3 |
Ultrafast electronic response of graphene to a strong and localized electric field — •Richard A. Wilhelm, Elisabeth Gruber, Rémi Pétuya, Roland Kozubek, Bernhard C. Bayer, Anke Hierzenberger, Valerie Smejkal, Florian Libisch, Iñigo Adalzabal, Andrey K. Kazansky, Arkady Krasheninnikov, Marika Schleberger, Stefan Facsko, Andrei G. Borisov, Andres Arnau, and Friedrich Aumayr
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10:15 |
DS 46.4 |
Epitaxial nitride thin films by ion mass and ion energy selective ion-beam assisted deposition — •Philipp Schumacher, Michael Mensing, Jürgen W. Gerlach, Stephan Rauschenbach, and Bernd Rauschenbach
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10:30 |
DS 46.5 |
Ion Induced Surface Pattern Formation by ion implantation — •Hans Hofsäss, Kun Zhang, and Omar Bobes
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10:45 |
DS 46.6 |
Chemical Diffusion of Potassium Ions in thin film PrMnO3 — •Karl-Michael Weitzel, Johannes Martin, Melanie Gräf, Thilo Kramer, and Christian Jooss
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