Dresden 2017 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 58: Quantum Dots: Optical Properties IV

HL 58.4: Talk

Wednesday, March 22, 2017, 15:45–16:00, POT 151

Deterministic integration of quantum dots into on-chip waveguides and beamsplitters by in-situ electron beam lithography — •Peter Schnauber¹, Oliver Kirsch¹, Ronny Schmidt¹, Arsenty Kaganskiy¹, Andre Strittmatter², Sven Rodt¹, and Stephan Reitzenstein¹ — ¹Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstrasse 36, 10623 Berlin, Germany — ²Abteilung für Halbleiterepitaxie, Otto-von-Guericke Universität, 39106 Magdeburg, Germany

On-chip waveguides and beamsplitters have proven to be suitable to realize basic quantum logic circuits. Moreover, quantum dots (QDs) can be integrated into such on-chip elements to act as quantum light sources. In order to efficiently couple the QD’s emission into a waveguide, the QD’s lateral position inside a thin waveguide must be precisely controlled. When integrating multiple QDs in complex waveguide circuits it is important to preselect and fine-adjust their emission wavelength to achieve for instance two-photon interference which is necessary for quantum gate operation. A spatially and spectrally deterministic integration of QDs into waveguides can be achieved by in-situ electron beam lithography (EBL)[1]. By applying our method, QDs are preselected by means of helium-temperature cathodoluminescence spectroscopy right before waveguides and beamsplitters are patterned in-situ with the naturally high resolution of EBL. Special care is taken to optimize the surface roughness of such low-temperature-patterned structures.

[1] M. Gschrey et al., Nat. Commun. 6, 7662 (2016)