Dresden 2017 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 79: Poster: New Materials
HL 79.21: Poster
Donnerstag, 23. März 2017, 15:00–19:00, P2-OG3
Effect of the different surface texture on the metal-insulator-silicon photoanodes performances for water photosplitting. — •Haojie Zhang1,2, Stefan L. Schweizer1, Alexander Sprafke1, and Ralf B. Wehrspohn1,2 — 1Institute of Physics, Martin-Luther-University Halle-Wittenberg, Germany — 2Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS
Metallurgical grade (MG) silicon processed with the metal-assisted chemical etching(MaCE) can not only promote the purity, but also from the nanostructures in the bulk of the MG silicon. Since the surface texture of the silicon was dominated the optical (e.g. reflection, scattering, carries, bending gap and charge-transfer rate) and chemical (e.g. catalytic site, surface area and defects) characteristics. Moreover, the stability in extremely acidic and basic electrolytes was concerned and could be effectively enhanced by coating a thin and robust tunneling layer (such TiO2, ZnO). Herein, the different texture surfaces of Si were demonstrated by MaCE with different catalytic and other methods as a comparison. A protecting layer and catalytic particles were deposited by Atomic Layer Deposition (ALD) to promote the durable and catalytic performance in the photoelectrochemical(PEC).