Dresden 2017 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 5: Session on Nanostructuring Beyond Conventional Lithography

MI 5.3: Hauptvortrag

Mittwoch, 22. März 2017, 12:00–12:30, MER 02

NanoFrazor Lithography - Revolutionizing nanofabrication — •Zhengming Wu¹, Colin Rawlings², Simon Bonanni¹, Tero Kulmala¹, Heiko Wolf², Urs Duerig², Armin W. Knoll², Martin Spieser¹, Philip Paul¹, and Felix Holzner¹ — ¹SwissLitho AG, Zurich, Switzerland — ²IBM Research - Zurich, Rueschlikon, Switzerland

Thermal Scanning Probe Lithography (t-SPL) is an alternative mask-less lithography technique which is also commercially available since 2014 under the name NanoFrazor Lithography. It provides similar speed (up to 20 mm/s) and resolution (10 nm half-pitch) as EBL, but without charged particles involved. In addition 3D topographical structures can be written in just one step at better than 2 nm vertical resolution. Here, we present the technology involved and the examples of high resolution and high density nano-structures made by the NanoFrazor for applications like photonics, plasmonics etc. Furthermore, the remaining topography from structures buried under the spin-coated resist is detectable and extremely accurate overlay alignment to these structures (e.g. nanowires & 2D material flakes) is achieved. The capability to write large area pattern is explored. The alternative applications of the heated tip are discussed.