MI 5: Session on Nanostructuring Beyond Conventional Lithography
Wednesday, March 22, 2017, 11:30–13:15, MER 02
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11:30 |
MI 5.1 |
X-ray waveguide optics — •Sarah Hoffmann-Urlaub, Mike Kanbach, Hsin-Yi Chen, and Tim Salditt
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11:45 |
MI 5.2 |
Additive Fabrication of Nanostructures with Focused Soft X-Rays — •Andreas Späth, Fan Tu, Florian Vollnhals, Hubertus Marbach, and Rainer H. Fink
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12:00 |
MI 5.3 |
Invited Talk:
NanoFrazor Lithography - Revolutionizing nanofabrication — •Zhengming Wu, Colin Rawlings, Simon Bonanni, Tero Kulmala, Heiko Wolf, Urs Duerig, Armin W. Knoll, Martin Spieser, Philip Paul, and Felix Holzner
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12:30 |
MI 5.4 |
Nanopillar with self-assembled Si nanodot for single electron transistor — •Thomas Prüfer, Karl-Heinz Heinig, Wolfhard Möller, and Johannes von Borany
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12:45 |
MI 5.5 |
Site-controlled formation of Si nanodots in a buried SiO2 layer via ion-beam implantation and phase separation — •Xiaomo Xu, Daniel Wolf, Gregor Hlawacek, René Hübner, Ahmed Gharbi, Thomas Prüfer, Lothar Bischof, Karl-Heinz Heinig, Stefan Facsko, and Johannes von Borany
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13:00 |
MI 5.6 |
Transmission Helium Ion Microscopy — Christoph Herrmann and •Karen L. Kavanagh
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