Dresden 2017 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 22: Poster session I

MM 22.18: Poster

Montag, 20. März 2017, 19:00–20:00, P4

The new Lithography Scanner of BL1 at DELTA — •Jennifer Bolle¹, Michael Paulus¹, Christian Sternemann¹, Georg Jülicher¹, Thorsten Witt¹, Joachim Schulz², Thomas Beckenbach², Pascal Meyer³, and Metin Tolan¹ — ¹Fakultät Physik/DELTA, TU-Dortmund, D-44221 Dortmund, Germany — ²microworks GmbH, Schnetzlerstr 9, 76137 Karlsruhe, Germany — ³Karlsruhe Institute of Technology, Institute of Microstructure Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen

There is a great demand for increasingly smaller micromechanical components. Deep X-ray lithography is a process to produce high quality microstructures with a lateral resolution in the μm-range, high aspect ratio and low sidewall roughness [1,2]. The structures are transferred by a shadow projection to a photosensitive resist [3]. At beamline 1 of DELTA synchtrotron source a new X-ray lithography scanner (Jenoptik scanner (DEX01)) provided by BESSY was implemented and commissioned. The setup was characterized using test structures, exploiting different filters, bottom doses, and thermal conditions. This way optimized exposure parameters were determined and finally structures of industrial quality standards were produced. [1] A. Risse, /Fertigungsverfahren der Mechatronik, Feinwerk-und Präzisionsgerätetechnik/, Springer, 503 (2012); [2] A. del Campo, C. Greiner, /Journal of Micromechanics and Microengineering /17(6), R81 (2007); [3] G. Feiertag et al., /Applied Physics Letters /71(11), 1441 (1997).