Dresden 2017 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 31: Oxide and Insulator Surfaces: Structure, Epitaxy and Growth I

O 31.1: Vortrag

Dienstag, 21. März 2017, 10:30–10:45, WIL C107

Ultra-thin Germania films on Ru(0001) and Pt(111) studied by Spectromicroscopy — •Alexander Fuhrich¹, Thomas Schmidt¹, Dietrich Menzel^1,2, and Hans-Joachim Freund¹ — ¹Department of Chemical Physics, Fritz-Haber-Institute of the Max-Planck Society, Berlin, Germany — ²Physik-Department E20, Technische Universität München, Garching, Germany

We studied the growth and structures of ultra-thin GeO₂ films supported on Ru(0001) and Pt(111). Germania is an analogue of Silica and has similar structures. Germanium growths epitaxially on both substrates which allows to determine the thickness of the ultra-thin Germania films. We studied the growth of Germanium in-situ and in real-time by LEEM and LEED. Germanium oxidizes partially already at room temperature on 3O-(2x2)-Ru(0001) and forms small domains. An alternative preparation recipe, where Ge is deposited on the pure (1x1)-Ru(0001) surface at elevated temperatures (540K) and subsequent oxidized in 10⁻⁶ mbar O₂ at 630K, yield in larger domain size. The morphology and structure of the oxide film will be discussed in dependence of the preparation parameters and the supporting substrate.