Dresden 2017 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 33: Nanostructures at Surfaces: Metals, Oxides and Semiconductors I
O 33.10: Vortrag
Dienstag, 21. März 2017, 12:45–13:00, REC/PHY C213
Semiconductor thin films with functionalized crystalline silicon nanoparticles — •Domenikos Chryssikos1, Francesco Casablanca1, Willi Aigner1, Martin Stutzmann1, Rui N. Pereira1,2, and Anna Cattani-Scholz1 — 1Walter Schottky Institut and Physik-Department, Technische Universität München, Am Coulombwall 4, 85748 Garching bei München, Germany — 2Department of Physics and Institute for Nanostructures, Nanomodelling and Nanofabrication, University of Aveiro, 3810-193 Aveiro, Portugal
Electronic devices incorporating solution-processable crystalline nanoparticles, in particular thin films of II-VI or IV-VI materials, have been the subject of many studies in recent years. However, up to now, only few works employ elemental semiconductors like silicon nanoparticles (Si-NPs), which are advantageous regarding their abundance and non-toxicity. In this work, we exploit the assembling of thin films of Si-NPs covalently bound to silicon oxide surfaces via alkyldiphosphonic acid molecules. The aim of this investigation is to create a stable immobilization and homogenous distribution of Si-NPs on solid substrates that can also allow for controlling the positioning of the semiconductor nanostructures. The structural and morphological properties of the Si-NP layers have been studied by X-ray photoelectron spectroscopy, contact angle measurements, atomic force microscopy and Raman spectroscopy. Moreover, these novel nanostructures have also been characterized with respect to their electronic properties using electrical conductivity measurements.