Dresden 2017 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 39: Oxide and Insulator Surfaces: Structure, Epitaxy and Growth II
O 39.4: Vortrag
Dienstag, 21. März 2017, 14:45–15:00, WIL C107
Scanned probe surface structure analysis of silicas - then and today — •Georg Hermann Simon1, Burkhard Kell1, Kristen Burson1,2, Markus Heyde1, and Hans-Joachim Freund1 — 1Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany — 2Current address: Department of Physics, Hamilton College, 198 College Hill Road, Clinton, NY 13323, USA
Silica and silicate surfaces play an important role in nature and materials applications. They offer a wealth of structures from crystalline quartz [1] via nanoporous zeolite crystals to amorphous silicate glass [2,3]. However, achieving atomic-scale surface science results for these materials has been challenging due to the structural complexity, charging problems common to bulk insulators, and the necessity for well-controlled sample preparations. Ultrathin silica films enable atomic-scale structural characterization and aid the study of bulk quartz and glass surfaces. Such silica films have been shown to exist in crystalline and amorphous modifications [4] which are stable in ultrahigh vacuum, air, and water [5]. Here we present an atomic scale study of ultrathin silica films and bulk silica samples in vacuum and liquid performed using scanning probe microscopy.
[1] F. Bart et al.; Surf. Sci. 311 (1994) L671.
[2] Raberg et al.; J. Non-Cryst. Solids 351 (2005) 1089.
[3] J.-F. Poggemann et al.; J. Non-Cryst. Solids 326-327 (2003) 15.
[4] Lichtenstein et al.; Angew. Chem. Int. Ed. 51 (2012) 404.
[5] Burson et al.; Appl. Phys. Lett. 108 (2016) 201602.