Dresden 2017 – scientific programme

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O: Fachverband Oberflächenphysik

O 51: Nanostructures at Surfaces: 1D and 2D Structures and Networks

O 51.15: Poster

Tuesday, March 21, 2017, 18:30–20:30, P1C

Electron beam induced surface activation - a novel method to study and reduce proximity effects — •Christian Preischl, Martin Drost, Fan Tu, and Hubertus Marbach — Friedrich-Alexander Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058, Erlangen, Germany

We apply different focused electron beam-based nanolithographic techniques in an ultra-high vacuum (UHV) environment. Recently, we explored Electron Beam Induced Surface Activation (EBISA), in which a surface is first chemically activated by the highly focused electron beam. In a second step, the activated regions can be developed with certain precursor molecules, resulting in the catalytic decomposition and eventually autocatalytic growth of the latter [1]. Suitable substrates for EBISA are oxide surfaces, thin organic films or surface anchored metal-organic frameworks. EBISA does not only allow for the controlled fabrication of well-defined nanostructures but also enables detailed insights into electron back-scattering processes by exploring and visualizing the corresponding proximity effects. Along with the presentation of these results, we will also discuss strategies to reduce proximity effects in electron beam lithography.

[1] H. Marbach, Appl. Phys. A, 117 (2014), 987;