Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 73: Nanostructures at Surfaces: Metals, Oxides and Semiconductors III
O 73.5: Vortrag
Mittwoch, 22. März 2017, 11:30–11:45, REC/PHY C213
Nanostructured metallic films grown by glancing angle deposition on non-patterned substrates — •Susann Liedtke, Christoph Grüner, and Bernd Rauschenbach — Leibniz Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
Glancing angle deposition (GLAD) represents a simple and elegant method to fabricate nanostructured thin films. GLAD combines an oblique angle between incoming particle flux and substrates normal as well as substrate rotation to sculpture nanostructure morphology. On the one hand, the presentation addresses general underlying growth principles of such nanostructured films, for example the nucleation process, self-shadowing and competitive growth. On the other hand, the role of surface diffusion on the morphology of Al-, Ti-, Cr- and Mo-nanostructures grown on unstructured Si(100) substrates at room temperature is discussed. In fact, the selection of these metals covers a wide range of melting points from Al (660 °C) to Mo (2617 °C). Since melting point and surface diffusion are connected, a comparison between those metallic nanostructures reveals possible reasons for the significant differences obtained in growth behavior. The nanostructures are investigated by scanning electron microscopy and x-ray diffraction measurements.