Dresden 2017 – scientific programme
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SYNS: Symposium Nanostructuring Beyond Conventional Lithography
SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)
SYNS 1.2: Invited Talk
Wednesday, March 22, 2017, 15:30–16:00, HSZ 02
High precision fabrication for light management at nanoscale — •Saulius Juodkazis1,2 and Armandas Balcytis1 — 1Swinburne University of Technology, Melbourne, Australia — 2Melbourne Center for Nanofabrication, Melbourne, Australia
For control of light-matter interactions occurring on molecular level we need to develop tools with nanoscale precision via nano-fabrication. Recent advances in high precision nanofabrication using 3D approaches and combining standard cleanroom tools with laser direct writing capabilities will be presented. Combination of electron beam lithography (EBL) with post-processing of nanoparticles with Ga-ion milling opens a possibility of sub-20 nm direct write of nano-inscriptions on nanoparticles. Arrays of identical chiral nanoparticles were fabricated with high fidelity and with uniform nano-features. Controlled resizing of ion-milled nanopores over the range of sizes from 100 nm to several nanometers in nano-membranes is achieved using electron beam scanning. Surface charging which is a common problem in applications of ion milling and electron imaging is resolved with co-illumination of deep UV light whose photons have energy larger than the electron work function for a given material. EBL and IBL can be both optimized for a high throughput for simple sample geometries. 3D laser fabrication of micro-optical elements and nano-textured surfaces adds new applications in lab-on-chip and sensing.