Dresden 2017 – wissenschaftliches Programm

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SYNS: Symposium Nanostructuring Beyond Conventional Lithography

SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)

SYNS 1.3: Hauptvortrag

Mittwoch, 22. März 2017, 16:00–16:30, HSZ 02

Directed self-assembly of performance materials — •Paul Nealey — University of Chicago and Argonne National Laboratory, Chicago, IL USA

Directed self-assembly (DSA) is arguably the most promising strategy for high-volume cost-effective manufacturing at the nanoscale. Over the past decades, manufacturing techniques have been developed with such remarkable efficiency that it is now possible to engineer complex systems of heterogeneous materials at the scale of a few tens of nanometers. Further evolution of these techniques, however, is faced with difficult challenges in terms of feasibility of implementation at the scale of 10 nm and below, and prohibitively high capital equipment costs. Materials that self-assemble, on the other hand, spontaneously form nanostructures down to length scales at the molecular scale, but the micrometer areas or volumes over which the materials self-assemble with adequate perfection in structure is incommensurate with the macroscopic dimensions of devices and systems of devices of industrial relevance. Directed self-assembly (DSA) refers to the integration of self-assembling materials with traditional manufacturing processes to enhance and augment capabilities. Here I will discuss the use of lithographically-defined chemically patterned surfaces to direct the assembly of block copolymer films for semiconductor manufacturing and ion-conducting membranes, liquid crystal based systems for optoelectronics, and nanoparticles for applications in nanophotonics.