Dresden 2017 – scientific programme
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SYNS: Symposium Nanostructuring Beyond Conventional Lithography
SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)
Wednesday, March 22, 2017, 15:00–17:45, HSZ 02
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15:00 | SYNS 1.1 | Invited Talk: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren |
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15:30 | SYNS 1.2 | Invited Talk: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis |
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16:00 | SYNS 1.3 | Invited Talk: Directed self-assembly of performance materials — •Paul Nealey |
| 16:30 | 15 min. break | ||
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16:45 | SYNS 1.4 | Invited Talk: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll |
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17:15 | SYNS 1.5 | Invited Talk: High resolution 3D nanoimprint lithography — •Hartmut Hillmer |