Dresden 2017 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
SYNS: Symposium Nanostructuring Beyond Conventional Lithography
SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)
Mittwoch, 22. März 2017, 15:00–17:45, HSZ 02
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15:00 | SYNS 1.1 | Hauptvortrag: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren |
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15:30 | SYNS 1.2 | Hauptvortrag: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis |
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16:00 | SYNS 1.3 | Hauptvortrag: Directed self-assembly of performance materials — •Paul Nealey |
| 16:30 | 15 min. break | ||
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16:45 | SYNS 1.4 | Hauptvortrag: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll |
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17:15 | SYNS 1.5 | Hauptvortrag: High resolution 3D nanoimprint lithography — •Hartmut Hillmer |