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A: Fachverband Atomphysik

A 31: Poster Session III

A 31.14: Poster

Donnerstag, 9. März 2017, 17:00–19:00, P OG1

Atom Lithography with a high flux Atom Laser beam — •Amir Kordbacheh and Nick Robins — Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 Australia

The focusing of neutral atoms by use of near-resonant light fields is the subject of intense interest in our project. This interest has been driven to a large extent by the possibility of generating focal spots on the nanometer scale by use of specially configured laser intensity profiles. The result is a technique for nanostructure fabrication with possibilities for both high resolution and massive parallelism [1]. In this configuration, each node of the standing wave acts as an individual lens, and the entire standing wave acts as a lens array. Because a standing-wave light field repeats with a periodicity of order λ/2, where λ is the wavelength of the light, a large array of structures can be fabricated in parallel. What we are aiming is to use a Rubidium, Bose Einstein Condensate (BEC) as a source of perfectly collimated Atom Laser beam in order to deposit the atoms on a given substrate. The most significant goal in this project is to reduce the resolution (FWHM) of the flux structure width as much as possible. Due to improving the resolution of the write beam, by some numerical simulations we are trying to optimize all the parameters regarding atoms and standing wave lens to find the best focal points and minimizing the effects of aberrations for our desired elements. Considering the s-wave interaction between atoms (the mean field potential) by the semi classical Gross- Piaevskii (GP) model, would be of a great importance which is taken into account.