Berlin 2018 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 20: Poster Session I
CPP 20.4: Poster
Montag, 12. März 2018, 17:30–19:30, Poster A
Rearrangement of nanopatterns: Wetting of n-alkane Molecular Films — Diego Diaz1, Tomas P. Corrales2, Maria J. Retamal3, Marcelo Cisternas1, Nicolas Moraga1, Rodrigo Catalan1, Mark Busch4, Patrick Huber4, Marco Soto-Arriaza3, and •Ulrich G. Volkmann1 — 1Institute of Physics and CIEN-UC, P. Univ. Catolica de Chile, Santiago, Chile — 2Department of Physics, UTFSM, Valparaiso, Chile — 3Faculty of Chemistry and CIEN-UC, P. Univ. Catolica de Chile, Santiago, Chile — 4TUHH, Hamburg, Germany
We present a study of the wetting properties of silicon samples coated with a single layer of n-alkane molecules self-assembled perpendicular to the surface. It is known that the filling fraction (between 10% to 50%) of molecules on the surface can be controlled by the withdrawal velocity of the silicon wafer from the coating solution. After sample preparation, the contact angle was measured of a 2 microliter drop of water placed on the patterned surface. The results of the apparent contact angle versus coverage can be grouped in two regimes that depend linearly on coverage, which is consistent with the Cassie wetting model. After drop evaporation, the molecules migrate to the center and the contact line of the area where the sessile drop was placed, leaving also a depletion zone. AFM studies showed that the original patterns restructure. Acknowledgements: Postdoctoral FONDECYT #3160803 (MJR), FONDECYT #1141105 (UGV) and #1171047 (MSA), FONDECYT INICIACION #11160664 (TPC), CONICYT Fellowships (RC, MC) and CONICYT-PIA ACT 1409.