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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 20: Poster Session I

CPP 20.51: Poster

Montag, 12. März 2018, 17:30–19:30, Poster A

Thin films of ultrahigh molecular weight diblock copolymers — •Wei Cao¹, Senlin Xia¹, Michael Appold², Markus Gallei², and Peter Müller-Buschbaum¹ — ¹TU München, Physik-Department, LS Funktionelle Materialien, 85748 Garching — ²TU Darmstadt, Ernst-Berl-Institute for Technical and Macromolecular Chemistry, 64287 Darmstadt

Block copolymer self-assembly has attracted considerable attention for many decades because it can yield ordered structures in a wide range of morphologies, including spheres, cylinders, bicontinuous structures, lamellae, vesicles, and many other complex or hierarchical assemblies. So far, most studies have used block copolymers with low or medium scale molecular weight. Due to scaling of the micro-phase separation structure with the molecular weight of the the block copolymers, large periods (about 100 nm) can be achieved with ultrahigh molecular weight (UHMW) block copolymers (Mn > 800 kg/mol). In thin film geometry this implies a confinement of the polymers. For polystyrene-block-polymethylmethacrylate UHMW diblock copolymers we prepare thin films. Different thermal and solvent post-treatments are studied to achieve highly ordered micro-phase separation structures. The film morphology is probed with atomic force microscopy (AFM), scanning electron microscopy (SEM) and grazing incence small angle x-ray scattering (GISAXS).