Berlin 2018 – scientific programme
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 25: Interfaces and Thin Films II
CPP 25.2: Talk
Tuesday, March 13, 2018, 10:00–10:15, PC 203
Solvothermal Annealing of a Diblock Copolymer Film in Solvent Vapor Mixtures — Anatoly V. Berezkin1, Florian Jung1, Dorthe Posselt2, Detlef-M. Smilgies3, and •Christine M. Papadakis1 — 1TU München, Physik-Department, Garching, Germany — 2Roskilde University, Department of Science and Environment, Denmark — 3Cornell University, Cornell High Energy Synchrotron Source, Ithaca NY, U.S.A.
Solvent vapor annealing is often used to control the structure of block copolymer thin films [1]. Solvothermal vapor annealing (STVA) combined with variable mixing of solvent vapors allows one to produce a number of morphologies. We carried out STVA on a thin film from polystyrene-b-polydimethylsiloxane (PS-b-PDMS) using vapors from n-heptane and toluene at elevated temperature, varying the vapor composition step by step. Cylindrical and lamellar morphologies are detected using in-situ, real-time grazing-incidence small-angle X-ray scattering. To corroborate these morphologies, they are generated by molecular simulations, and the corresponding 2D GISAXS maps are calculated. The solvent distribution in the two types of nanodomains is estimated from the intensity of the Bragg reflections along with the swelling ratio of the film. The combination of these methods opens up for the efficient preparation of block copolymer thin films having the desired morphology and orientation and furthers the understanding of the underlying mechanisms.
[1] Posselt et al., Prog. Polym. Sci. 66, 80 (2017).