|
Mo, 09:30–11:30 |
H 0111 |
DS 1: Layer Properties: Electronic, Optical and Mechanical |
|
|
|
Mo, 09:30–13:15 |
H 2032 |
DS 2: 2D Materials: Session I (joint session DS/CPP/HL) |
|
|
|
Mo, 09:30–13:15 |
E 020 |
DS 3: Oxide Semiconductors for Novel Devices (Focussed Session): Session I |
|
|
|
Mo, 10:30–13:00 |
HL 001 |
DS 4: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials I (joint session O/MM/DS/TT/CPP) |
|
|
|
Mo, 11:45–13:15 |
H 0111 |
DS 5: Layer Deposition (ALD, MBE, Sputtering, ...) |
|
|
|
Mo, 15:00–18:15 |
H 0111 |
DS 6: Thin Film Applications |
|
|
|
Mo, 15:00–17:45 |
H 2032 |
DS 7: Thin Film Properties: Structure, Morphology and Composition (XRD, TEM, XPS, SIMS, RBS, AFM, ...): Session I |
|
|
|
Mo, 15:00–16:30 |
EW 201 |
DS 8: 2D materials (joint session HL/DS) |
|
|
|
Mo, 15:00–17:15 |
HL 001 |
DS 9: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials II (joint session O/MM/DS/TT/CPP) |
|
|
|
Mo, 15:00–18:15 |
E 020 |
DS 10: Oxide Semiconductors for Novel Devices (Focussed Session): Session II |
|
|
|
Di, 09:30–13:15 |
H 0111 |
DS 11: Thin Film Properties: Structure, Morphology and Composition (XRD, TEM, XPS, SIMS, RBS, AFM, ...): Session II |
|
|
|
Di, 09:30–13:15 |
H 2032 |
DS 12: 2D Materials: Session II (joint session DS/CPP/HL) |
|
|
|
Di, 09:30–11:30 |
E 020 |
DS 13: Oxide Semiconductors for Novel Devices (Focussed Session): Session III |
|
|
|
Di, 10:30–13:00 |
HL 001 |
DS 14: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials III (joint session O/MM/DS/TT/CPP) |
|
|
|
Di, 11:45–13:00 |
E 020 |
DS 15: Thermoelectric and Phase Change Materials |
|
|
|
Di, 14:00–15:45 |
A 151 |
DS 16: 2D materials: Graphene and BN (joint session HL/DS) |
|
|
|
Di, 18:15–20:15 |
Poster B |
DS 17: Poster Session I |
|
|
|
Mi, 09:30–13:15 |
H 0111 |
DS 18: Optical Analysis of Thin Films (Reflection, Ellipsometry, Raman, IR-DUV Spectroscopy, ...): Session I |
|
|
|
Mi, 09:30–13:00 |
H 2032 |
DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM) |
|
|
|
Mi, 09:30–13:15 |
A 151 |
DS 20: 2D materials: Chalcogenides I (joint session HL/DS) |
|
|
|
Mi, 10:30–13:00 |
HL 001 |
DS 21: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials IV (joint session O/MM/DS/TT/CPP) |
|
|
|
Mi, 15:00–15:45 |
H 0111 |
DS 22: Optical Analysis of Thin Films (Reflection, Ellipsometry, Raman, IR-DUV Spectroscopy, ...): Session II |
|
|
|
Mi, 15:00–18:00 |
H 2032 |
DS 23: Lithography II: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Afternoon Session (joint session DS/KFM) |
|
|
|
Mi, 15:00–17:45 |
HL 001 |
DS 24: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials V (joint session O/MM/DS/TT/CPP) |
|
|
|
Mi, 16:00–18:15 |
H 0111 |
DS 25: Organic Thin Films, Organic-Inorganic Interfaces: Session I (joint session DS/CPP) |
|
|
|
Mi, 18:30–19:30 |
H 0111 |
DS 26: Annual General Meeting of the Thin Films division |
|
|
|
Do, 09:30–13:15 |
H 2032 |
DS 27: New Twists for Nanoquakes on a Chip - Emerging Applications of Surface Acoustic Waves in Condensed Matter Physics (Focussed Session): Session I |
|
|
|
Do, 09:30–13:15 |
A 151 |
DS 28: 2D materials: Chalcogenides II (joint session HL/DS) |
|
|
|
Do, 09:30–12:50 |
EMH 025 |
DS 29: Lithography III: Lithography and Structuring (joint session KFM/DS) |
|
|
|
Do, 10:30–12:45 |
HL 001 |
DS 30: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials VI (joint session O/MM/DS/TT/CPP) |
|
|
|
Do, 11:15–13:15 |
Poster F |
DS 31: Poster Session II |
|
|
|
Do, 12:30–13:00 |
EW 201 |
DS 32: Invited Talk: Michael Heuken (joint session HL/DS) |
|
|
|
Do, 15:00–15:45 |
H 2032 |
DS 33: New Twists for Nanoquakes on a Chip - Emerging Applications of Surface Acoustic Waves in Condensed Matter Physics (Focussed Session): Session II |
|
|
|
Do, 15:00–17:45 |
HL 001 |
DS 34: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials VII (joint session O/TT/MM/DS/CPP) |
|
|
|
Do, 15:00–18:10 |
EMH 025 |
DS 35: Lithography IV: Lithography and Structuring (joint session KFM/DS) |
|
|
|
Fr, 09:30–11:00 |
H 0111 |
DS 36: Organic Thin Films, Organic-Inorganic Interfaces: Session II (joint session DS/CPP) |
|
|
|
Fr, 09:30–12:30 |
H 2032 |
DS 37: 2D Materials: Session III (joint session DS/CPP/HL) |
|
|
|
Fr, 10:30–12:45 |
HL 001 |
DS 38: Focus Session: Frontiers of Electronic-Structure Theory: Correlated Electron Materials VIII (joint session O/TT/MM/DS/CPP) |
|
|