Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 11: Thin Film Properties: Structure, Morphology and Composition (XRD, TEM, XPS, SIMS, RBS, AFM, ...): Session II

DS 11.12: Vortrag

Dienstag, 13. März 2018, 12:30–12:45, H 0111

Room temperature atomic layer deposition for perovskite solar cells — •Malgorzata Kot¹, Lukas Kegelmann², Peter Kus³, Nataliya Tsud³, Iva Matolinova³, Steve Albrecht², Vladimir Matolin³, and Dieter Schmeisser¹ — ¹BTU Cottbus-Senftenberg, Konrad-Wachsmann-Allee 17, 03046 Cottbus — ²Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Institut für Silizium-Photovoltaik, Kekuléstraße 5, 12489 Berlin, Germany — ³Department of Surface and Plasma Science, Charles University, Prague, 18000, Czech Republic

After few years of efficiency driven research on perovskite solar cells, the focus now is shifting to understand the underlying processes governing the high efficiency and also to obtain long-term stable devices. Among various deposition methods, atomic layer deposition (ALD) may represent one of the best options, being possible to coat substrates in a very efficient way and at very low temperatures. In our previous work [1] we reported that the efficiency of the solar cell containing aged perovskite film can be enhanced twice while covering the perovskite with a thin ALD alumina film at room temperature. In this work, the chemical, electronic and morphological properties of the fresh perovskite film treated by ALD pulses of the trimethylaluminium and water at room temperature investigated using X-ray Photoelectron Spectroscopy and Field Emission Scanning Electron Microscopy will be discused and correlated with the solar cells performance and stability.

[1] M. Kot et al., ChemSusChem 2016, 9, 3401.