Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster Session I

DS 17.27: Poster

Dienstag, 13. März 2018, 18:15–20:15, Poster B

Evaluation of critical electron doses for surface activation in electron beam induced surface activation (EBISA) — •Florian Vollnhals, Christian Preischl, Martin Drost, Fan Tu, and Hubertus Marbach — Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058, Erlangen

The world of focussed electron beam induced processing encompasses not only electron beam induced deposition (EBID) and etching (EBIE), but also techniques like electron beam induced surface activation (EBISA).¹ In EBISA, an surface is locally modified by a electron beam such that it becomes active towards the decomposition of a subsequently dosed precursor, here Fe(CO)₅. The deposit can grow autocatalytically, i.e. via the local decomposition of further Fe(CO)₅ molecules, to form clean, polycrystalline iron deposits on the surface. Susceptible surfaces include oxides (TiO₂, SiO₂) as well as molecular layers (Porphyrins on various substrates).

In order to better understand the activation mechanisms and their dependence on the experimental parameters, we exploit the backscattering behavior of electrons commonly observed as BSE proximity effect to fabricate deposits and compare these to Monte-Carlo simulations. This allows to evaluate critical activation parameters and asses their implications for the EBISA process.

¹ Walz et al., Angew. Chem. Int. Ed. 49 (2010), 4669; Marbach, Appl. Phys. A 117 (2014), 987; Drost et al., Small Methods, 1 (2017) 1700095