Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster Session I

DS 17.77: Poster

Dienstag, 13. März 2018, 18:15–20:15, Poster B

Electrochemical Deposition of Compact or Porous ZnO Thin Films on Metallic or Non-Metallic 3D-Microstructures — •Dominik Damtew, Martina Stumpp, and Derck Schlettwein — IAP, JLU Giessen, Germany

Semiconducting thin films of ZnO are of interest as electrode materials, e.g. in dye-sensitized solar cells, chemical sensors. Compared to physical gas-phase methods like thermal evaporation or sputtering, electrochemical deposition of thin films is more cost effective, less harmful to the environment and allows deposition onto complex-shaped objects and into blind holes. Our study is focused on the electrochemical deposition of ZnO out of aqueous zinc nitrate or zinc chloride baths at 70 ^∘C onto metallic and non-metallic wires, nets and 3D foams. Aside from the deposition of thin compact ZnO films, hybrid ZnO/dye (EosinY) films were deposited to produce porous films following dissolution of EosinY. Depositions were carried out both by galvanodynamic and by potentiostatic methods. The films were characterized by laser and scanning electron microscopy. Applying short (galvanodynamic) pulses of 10 ms of a constant current density of around 7.5 - 35 mA/cm² allowed deposition of very homogenous compact ZnO films on different materials and structures. Porous films could be deposited with pore sizes of 1 - 20 nm. The galvanodynamic method proved as perfectly suited to deposit in deeper regions of the 3D structures, while potentiostatic deposition led to film growth preferably on outer regions and to less homogenous films.