Berlin 2018 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)

Mittwoch, 14. März 2018, 09:30–13:00, H 2032

Considering 3D printing using fused-deposition modeling or higher-resolution variants with lasers applicable to polymers and metals, an analogous approach exists on the nanometer scale. With the aid of focused electron beam-induced deposition (FEBID) it is possible to create solid-state structures on the nanoscale. However, in contradistinction to large-scale 3D printing of simple plastic or metallic structures, FEBID is able to directly provide nano-materials with a wealth of interesting electronic, optical and magnetic properties. Due to this, focused electron beam-induced deposition has experienced a rapid expansion in the breadth of its application fields over the last 10 years. FEBID uses precursor gases which, being adsorbed on a surface, are dissociated in the focussed electron beam to form the deposit. Intensive research has pushed the capabilities of FEBID in two important areas. It is now possible to obtain fully metallic nanostructures of Fe, Co and FeCo-alloys and also of Au and Pt. In addition, very recently the simulation-guided nano-manufacturing of 3D structures has matured to such a degree that even complex 3D objects can now be fabricated under controlled conditions. The focused session will address these new developments spanning the range from the fundamentals of electron-precursor interaction, covering aspects of the rational design of optimized precursors, and showing recent work on superconducting, magnetic and plasmonically active materials, both in 2D and 3D.

Organized by

Name: Prof. Dr. Michael Huth, Institution: Physikalisches Institut, Goethe-Universität, City: Frankfurt am Main, Country: Germany, Email: michael.huth@physik.uni-frankfurt.de, Telephone number: +49-69-798-47235

Name: Ass. Prof. Dr. Harald Plank, Institution: Institut für Elektronenmikroskopie und Nanoanalytik, TU Graz, City: Graz, Country: Austria, Email: harald.plank@felmi-zfe.at, Telephone number: +43-316-873-8821

Name: Dr. Ivo Utke, Institution: EMPA, Swiss Laboratories for Materials Science and Technology, City: Thun, Country: Switzerland, Email: Ivo.Utke@empa.ch, Telephone number: +41-58-765-6257

	09:30	DS 19.1	Hauptvortrag: 3D direct-write nanofabrication using an electron beam — •Jason Fowlkes, Robert Winkler, Eva Mutunga, Brett Lewis, Harald Plank, and Philip Rack
	10:00	DS 19.2	Hauptvortrag: Nanosuperconductivity with Focused Particle Beam Induced Deposition structures — •Rosa Córdoba, Javier Sesé, and José María De Teresa
	10:30	DS 19.3	Hauptvortrag: Chemistry for ELectron-Induced NAnofabrication — •Petra Swiderek
	11:00	DS 19.4	Hauptvortrag: The direct electron beam writing of plasmonic nanostructures — •Katja Höflich
	11:30		15 min. break.
	11:45	DS 19.5	High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals — •Robert Winkler, Brett Lewis, Jason Fowlkes, Philip Rack, and Harald Plank
	12:00	DS 19.6	Direct printing of 3D nano-structures via focused electron beam induced deposition: Pattern generation — •Lukas Keller and Michael Huth
	12:15	DS 19.7	Mechanical Properties of 3D Nano-Architectures Fabricated via Focused Electron Beam Induced Deposition — Johannes Froech, Juergen Sattelkow, Robert Winkler, Christian Schwalb, Ernest Fantner, and •Harald Plank
	12:30	DS 19.8	Direct-Write Fabrication of Electric and Thermal High-Resolution Nano-Probes on Self-Sensing AFM Cantilever — •Juergen Sattelkkow, Johannes Froech, Robert Winkler, Christian Schwalb, Ernest Fantner, Vlado Stavrov, and Harald Plank
	12:45	DS 19.9	Correlative in-situ characterization of 3D nanostructures by combining SEM and AFM — •Christian Schwalb, Marcel Winhold, Pinar Frank, Stefan Hummel, Roland Sachser, Michael Huth, Jürgen Sattelkow, and Harald Plank