Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)

DS 19.4: Hauptvortrag

Mittwoch, 14. März 2018, 11:00–11:30, H 2032

The direct electron beam writing of plasmonic nanostructures — •Katja Höflich — Helmholtz Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, D – 14109 Berlin, Germany

Future IT systems will rely on photons instead of electrons. The potentially huge bandwidth of photons and their extremely small switching times render light indispensable for telecommunication and for information processing. The use of plasmonic nanostructures constitutes a promising approach for nanoscale optical devices since their minimum geometric features are not restricted by the diffraction limit.

The technique of electron beam induced deposition (EBID) has the potential to evolve as a novel route for the fabrication of complex plasmonic devices. EBID nanostructures are grown by the local dissociation of precursor molecules in the focus of an electron beam. While the focused electrons account for minimum structural features, the direct writing provides access to three dimensions in a single step.

A major challenge lies at depositing pure materials. It can be addressed by testing novel precursor compounds, oxidation-based purification or by using EBID nanostructures as a scaffold to be coated with the metal of choice. Recent examples of EBID-based plasmonic nanostructures include silver and gold helices with a strong dichroism in the visible range as well as silver nanostructures based on a novel carboxylate precursor.