Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)
DS 19.5: Vortrag
Mittwoch, 14. März 2018, 11:45–12:00, H 2032
High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals — •Robert Winkler1,2, Brett Lewis3,4, Jason Fowlkes3,4, Philip Rack3,4, and Harald Plank1,2 — 1Institute for Electron Microscopy and Nanoanalysis Graz University of Technology, 8010 Graz, Austria — 2Graz Centre for Electron Microscopy, 8010 Graz, Austria — 3Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA — 4Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA
3D-printing of functional structures has emerged to an important technology in research and development, although it becomes very challenging when aiming on nano-sized geometries. Among the very few direct-write techniques on that scale, Focused Electron Beam Induced Deposition (FEBID) has been demonstrated to be a promising candidate as it allows the fabrication of functional, freestanding 3D nano-architectures on almost any substrate, enabling novel applications. Predictable, reliable and reproducible fabrication, however, often suffered due to the numerous process parameter and their mutual relationships. In this contribution, we comprehensively discuss the complex interplay between most process parameters and successfully trace back their implications to the precursor working regime. Beside the fundamental aspect of our findings, we separate dominant parameters from those with minor implications. By that, we are able to explain unwanted deviations during 3D growth and derive certain rules for precise, predictable and reproducible 3D-nanofabrication via FEBID.