Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)

DS 19.6: Vortrag

Mittwoch, 14. März 2018, 12:00–12:15, H 2032

Direct printing of 3D nano-structures via focused electron beam induced deposition: Pattern generation — •Lukas Keller and Michael Huth — Institute of Physics, Goethe University, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany

Fabrication of three-dimensional (3D) nano-architectures by focused electron beam induced deposition (FEBID) has matured to a level that highly complex and functional deposits are becoming available for nanomagnetics and plasmonics. The main issue of generating a desired 3D nano-structure is the control of the electron beam in the x-y-plane. However, the generation of suitable pattern files that define the electron beam deflection at any time during the deposition and reliably map the desired target 3D structure from a purely geometrical description to a shape-conforming 3D deposit is non trivial. Here we present our implementation of a pattern file generator that handles proximity effects, corrects for height-dependent precursor coverage and avoids shadowing effects regarding the directed component of the precursor flux. Several examples of successful 3D nano-fabrication using different precursors are presented that attest the effectiveness of the implementation.